Semiconductor
ESWIN provides high-quality monocrystalline silicon polished wafers and epitaxial wafers for ICs, which are widely used in electronic communication, automobile manufacturing, artificial intelligence, consumer electronics and other fields.
ESWIN selects advanced equipment and processes, in combination with the highest level of clean room design and production control, to manufacture super-flat, superior nanotopography 12-inch silicon wafers that are free of dislocations or intrinsic flaws. At present, ESWIN owns a silicon industry base in Xi’an, with a design production capacity of 500,000 pieces per month. Main products are monocrystalline silicon polished wafers and epitaxial wafers used in ICs. The applicable fields include logic IC, 3D NAND & Nor Flash, DRAM, CIS, and Display Driver IC, etc.
SIAMC Advanced Materials Co., Ltd. was founded in 2007, it is a high-tech enterprise in China that is a leading developer and producer of large-scale, high-quality special graphite materials and has two production bases located in Huzhou, Zhejiang and Yinchuan, Ningxia, with a total area of approximately 1000 acres. The company has advanced, environmentally friendly production processes, and its graphite and carbon material products are widely used in the fields of clean energy, renewable energy, semiconductors, industrial furnaces, and precision mold. The company provides value-added services and products based on graphite and carbon materials, including precision machining, material purification, surface treatment, and inspection and testing.